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Download the fantastic book titled Atomic Layer Deposition written by Tommi Kääriäinen, available in its entirety in both PDF and EPUB formats for online reading. This page includes a concise summary, a preview of the book cover, and detailed information about "Atomic Layer Deposition", which was released on 28 May 2013. We suggest perusing the summary before initiating your download. This book is a top selection for enthusiasts of the Technology & Engineering genre.

Summary of Atomic Layer Deposition by Tommi Kääriäinen PDF

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

Atomic Layer Deposition

Detail About Atomic Layer Deposition PDF

  • Author : Tommi Kääriäinen
  • Publisher : John Wiley & Sons
  • Genre : Technology & Engineering
  • Total Pages : 274 pages
  • ISBN : 1118062779
  • PDF File Size : 30,9 Mb
  • Language : English
  • Rating : 4/5 from 21 reviews

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Atomic Layer Deposition

Atomic Layer Deposition
  • Publisher : John Wiley & Sons
  • File Size : 32,5 Mb
  • Release Date : 28 May 2013
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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the

Atomic Layer Deposition for Semiconductors

Atomic Layer Deposition for Semiconductors
  • Publisher : Springer Science & Business Media
  • File Size : 26,6 Mb
  • Release Date : 18 October 2013
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Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews

Atomic Layer Deposition (ALD)

Atomic Layer Deposition (ALD)
  • Publisher : Unknown Publisher
  • File Size : 22,9 Mb
  • Release Date : 16 June 2024
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Atomic layer deposition (ALD) is a thin film deposition technique used in the mass production of microelectronics. In this book, novel nonvolatile memory devices are discussed. The chapters examine the

Atomic Layer Deposition in Energy Conversion Applications

Atomic Layer Deposition in Energy Conversion Applications
  • Publisher : John Wiley & Sons
  • File Size : 20,8 Mb
  • Release Date : 30 May 2017
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Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they

Atomic Layer Deposition of Nanostructured Materials

Atomic Layer Deposition of Nanostructured Materials
  • Publisher : John Wiley & Sons
  • File Size : 29,8 Mb
  • Release Date : 19 September 2012
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Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability.

Chemical Vapor Deposition for Nanotechnology

Chemical Vapor Deposition for Nanotechnology
  • Publisher : BoD – Books on Demand
  • File Size : 33,7 Mb
  • Release Date : 10 January 2019
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Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such

Chemistry of Atomic Layer Deposition

Chemistry of Atomic Layer Deposition
  • Publisher : Walter de Gruyter GmbH & Co KG
  • File Size : 26,8 Mb
  • Release Date : 08 November 2021
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This book will help chemists and non-chemists alike understand the fundamentals of surface chemistry and precursor design, and how these precursors drive the processes of atomic layer deposition, and how

Handbook of Crystal Growth

Handbook of Crystal Growth
  • Publisher : Elsevier
  • File Size : 53,8 Mb
  • Release Date : 04 November 2014
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Vol 2A: Basic Technologies Handbook of Crystal Growth, 2nd Edition Volume IIA (Basic Technologies) presents basic growth technologies and modern crystal cutting methods. Particularly, the methodical fundamentals and development of

Organometallic Chemistry

Organometallic Chemistry
  • Publisher : Royal Society of Chemistry
  • File Size : 44,9 Mb
  • Release Date : 28 November 2018
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With the increase in volume, velocity and variety of information, researchers can find it difficult to keep up to date with the literature in their field. Providing an invaluable resource,

Atomic Layer Deposition Applications 6

Atomic Layer Deposition Applications 6
  • Publisher : The Electrochemical Society
  • File Size : 42,8 Mb
  • Release Date : 01 October 2010
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The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the focus of this reoccurring symposium. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3