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Atomic Layer Deposition Applications 11

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  • Author : F. Roozeboom
  • Publisher : The Electrochemical Society
  • Genre :
  • Total Pages : 281 pages
  • ISBN : 1607686724
  • PDF File Size : 18,6 Mb
  • Language : English
  • Rating : 4/5 from 21 reviews

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Atomic Layer Deposition Applications 3

Atomic Layer Deposition Applications 3
  • Publisher : The Electrochemical Society
  • File Size : 28,8 Mb
  • Release Date : 23 June 2024
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The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the symposium focus. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topography, with

Atomic Layer Deposition Applications 5

Atomic Layer Deposition Applications 5
  • Publisher : The Electrochemical Society
  • File Size : 44,8 Mb
  • Release Date : 01 September 2009
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Atomic Layer Deposition can enable precise deposition of ultra-thin, highly conformal coatings over complex 3D topography, with controlled composition and properties for a wide range of applications.

Atomic Layer Deposition for Semiconductors

Atomic Layer Deposition for Semiconductors
  • Publisher : Springer Science & Business Media
  • File Size : 21,7 Mb
  • Release Date : 18 October 2013
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Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews

Atomic Layer Deposition of Nanostructured Materials

Atomic Layer Deposition of Nanostructured Materials
  • Publisher : John Wiley & Sons
  • File Size : 28,5 Mb
  • Release Date : 19 September 2012
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Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability.